On both spatial and velocity distribution of sputtered particles in magnetron discharge
Pages 43-57
C. Vitelaru, V. Pohoata, V. Tiron, C. Costin, G. Popa
Abstract
The kinetics of the sputtered atoms from the metallic target as well as the
time-space distribution of the argon metastable atoms have been
investigated for DC and high power pulse magnetron discharge by means
of Tunable Diode – Laser Absorption Spectroscopy (TD-LAS) and
Tunable Diode – Laser Induced Fluorescence (TD-LIF). The discharge
was operated in argon (5-30 mTorr) with two different targets, tungsten
and aluminum, for pulses of 1 to 20 µs, at frequencies of 0.2 to 1 kHz.
Peak current intensity of ~100 A has been attained at cathode peak
voltage of ~1 kV. The mean velocity distribution functions and particle
fluxes of the sputtered metal atoms, in parallel and perpendicular direction
to the target, have been obtained and compared for DC and pulse mode.