THIN FILMS DEPOSITED BY THERMIONIC VACCUM ARC METHOD
Pages 178-186
V. Ciupina1, R. Vladoiu, C. P. Lungu, I Mustata, G. Prodan, V. Bursikova, G. Musa1
Abstract
In this paper we are promoting a novel technique called Thermoionic Vacuum Arc (TVA) for deposition of
thin films. This type of arc ignites in high vacuum conditions in the vapors of the anode material,
continuously generated by the electron bombardment of the anode. The TVA method is characterized by
producing plasma in the pure vapors of the metal to be deposited (C or W) without using any buffer gas.